- Atomic Layer Deposition
염원균
YEOM WON KYUN
- VHF ALD, 삼성전자 반도체연구소
김호곤
KIM HO GON
- 삼성전자 Foundry 사업부
장준기
JANG JUN KI
- Capacitively Coupled Plasma
탁현우
TAK HYUN WOO
- Atomic Layer Etching
장윤종
JANG YUN JONG
- Pulsed Plasma Etching
김희주
KIM HEE JU
- 2D Materials
강지은
KANG JI EUN
- Inductively Coupled Plasma
홍종우
HONG JONG WOO
- Isotropic Plasma Etching
길홍성
GIL HONG SEONG
- VHF Atomic Layer Deposition
정선재
JEONG SUN JAE