Geun Young Yeom
School of Advanced Materials Science and Engineering, Sungkyunkwan University
E-mail : email@example.com
(1977-1981) Hanyang University: B.S. in Metallurgical Engineering
(1981-1983) Seoul National University: M.S. in Materials Engineer
(1984-1989) University of Illinois at Urbana-Champaign, USA: Ph.D. in Electronic Materials Engineering
(1984-1989) Research Assistant, University of Illinois at Urbana-Champaign
(1989-1991) Process Engineer, Institute of Semiconductors in Tektronix Inc. USA
(1991-1992) Senior Engineer, Institute of Semiconductors in TDK Corporation (SSI Inc.), USA
(1992-Present) Professor, School of Advanced Materials Science and Engineering, SKKU
1. Plasma Processing
- Etch Technology (Atomic Layer Etching, Neutral Beam Etching, Ion Beam Etching, Pulsed Plasma Etching)
- Dry Cleaning Technology (Radical Cleaning)
- Deposition Technology (PEALD, VHF-PEALD, ICP-assisted Sputtering)
- Liquid HFC Etching
2. Two-dimensional (2D) Material Applications (Graphene, MoS2, Black Phosphorus, etc.)
"Fabrication of high-performance graphene nanoplatelet-based transparent electrodes via self-interlayer-exfoliation control"
Nanoscale, 10, 2351 (2018)
"Atomic Layer Etching Mechanism of MoS2 for Nanodevices"
ACS Appl. Mater. Interfaces, 9, 11967−11976 (2017)
"Atomic layer etching of graphene through controlled ion beam for graphene-based electronics"
Scientific Reports, 7, 2462 (2017)
"Chlorine-trapped CVD bilayer graphene for resistive pressure sensor with high detection limit and high sensitivity"
2D Materials, 4, 025049 (2017)